MOISTURE MEASUREMENT WAFER, CALIBRATION METHOD OF MOISTURE METER AND STATE EVALUATION METHOD OF HEAT TREATMENT FURNACE

摘要

PROBLEM TO BE SOLVED: To provide a moisture measurement wafer and a calibration method of a moisture meter which can readily calibrate a moisture meter, and provide a state evaluation method of a heat treatment furnace which can evaluate the change of temperature inspection condition inside the heat treatment furnace.;SOLUTION: A moisture meter 13 is calibrated by using a moisture measurement wafer 40 wherein an oxide film, whose desorbed water amount is known, is formed. The state of a heat treatment furnace 10 is evaluated based on measurement of a furnace inspection temperature whereat the amount of water contained in an atmosphere formed inside the heat treatment furnace 10 takes a maximum value when the moisture measurement wafer 40 is subjected to a temperature rise in the heat treatment furnace 10.;COPYRIGHT: (C)2003,JPO