TREATMENT APPARATUS FOR WASTEWATER CONTAINING GALLIUM AND ARSENIC

摘要

PROBLEM TO BE SOLVED: To provide a treatment apparatus for wastewater containing gallium and arsenic for treating wastewater containing gallium and arsenic discharged from a compound semiconductor wafer manufacturing factory, a device manufacturing factory or the like not only to efficiently recover gallium being an especially scarce and valuable metal but also to prevent flocculated sedimented sludge of arsenic.;SOLUTION: The treatment apparatus for wastewater containing gallium and arsenic has a gallium adsorption means for adsorbing gallium in wastewater containing gallium and arsenic, a membrane separation means for concentrating arsenic in the treated water of the gallium adsorption means and an arsenic removing means for removing arsenic in the permeated water of the membrane separation means.;COPYRIGHT: (C)2003,JPO