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PHOTOMASK FOR ABERRATION MEASUREMENT, ABERRATION MEASURING METHOD, INSTRUMENT FOR ABERRATION MEASUREMENT, AND MANUFACTURING METHOD FOR THE INSTRUMENT
PHOTOMASK FOR ABERRATION MEASUREMENT, ABERRATION MEASURING METHOD, INSTRUMENT FOR ABERRATION MEASUREMENT, AND MANUFACTURING METHOD FOR THE INSTRUMENT
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机译:用于像差测量的光掩模,像差测量方法,用于像差测量的仪器以及用于该仪器的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a photmask for aberration measurement which makes it possible to measure an aberration of a lens with small trouble by subdividing a field, an aberration measuring method, an instrument for aberration measurement, and a manufacturing method for the instrument. SOLUTION: The photomask 5 for aberration measurement is equipped with a substrate 1 which transmits exposure light, a plurality of opening patterns 2a for measurement which are formed on the top surface of the substrate in a plurality of measurement pattern formation areas, a shading film 3 which is formed on the reverse surface of the substrate 1 in the measurement pattern formation area and has a reverse-surface opening pattern 3a for making substantially different the angles of incidence of the exposure light on the plurality of opening patterns 2a for measurement, and a plurality of reference patterns 2b which are formed on the top surface of the substrate 1 in one or more reference pattern formation areas; and the reverse surface of the substrate 1 in the reference pattern formation areas has substantially the same angles of incidence of exposure light on the plurality of reference patterns 2b.
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