首页> 外国专利> ANGLE CALIBRATION APPARATUS USING X-RAY POLYHEDRAL MIRROR AND ANGLE CALIBRATION METHOD USING THE SAME

ANGLE CALIBRATION APPARATUS USING X-RAY POLYHEDRAL MIRROR AND ANGLE CALIBRATION METHOD USING THE SAME

机译:使用X射线多面镜的角度校准装置和使用相同角度校准方法

摘要

PROBLEM TO BE SOLVED: To provide an angle calibration apparatus using an X-ray polyhedral mirror, and an angle calibration method using the same. ;SOLUTION: When the center axis of an X-ray polygon crystal 7 is set to [0, 1, -1] of a silicon single crystal, a surface index enabling geometric reflection becomes xhh and a large number of reflecting surfaces are obtained according to an extinction rule of X-ray diffraction of a diamond structure. Since a 110 axis is twice symmetry, these reflecting surfaces appear on an opposite side and, in this case, 340 reflecting surfaces in total can be utilized. Two orthogonal reflecting surfaces in the X-ray polygon crystal 7 are set so as to be made parallel to two posture adjusting tilt stages 5 and the center is allowed to coincide with the center of a rotary table 8 by an XY stage 5 and the reflection of X-rays is utilized to adjust the center line of the X-ray polygon crystal 7 so as to make the same parallel to the axis of the rotary table 8 so that the center line is almost overlapped with the axis of the rotary table 8. When the X-ray polygon crystal 7 after adjustment is rotated, Bragg reflection is successively generated and the position of a Bragg angle can be determined by a reflection intensity curve caught by an X-ray detector 9.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种使用X射线多面镜的角度校准装置以及使用该角度校准装置的角度校准方法。 ;解决方案:当X射线多晶体7的中心轴设置为硅单晶的[0,1,-1]时,能够进行几何反射的表面折射率变为xhh,并且根据符合钻石结构X射线衍射的消光规则。由于110轴是两次对称,因此这些反射面出现在相反的一侧,在这种情况下,总共可以使用340个反射面。 X射线多角晶体7中的两个正交反射面被设置为与两个姿势调整倾斜台5平行,并且通过XY台5和反射使中心与旋转台8的中心重合。利用X射线的角度调整X射线多晶体7的中心线,使其平行于旋转台8的轴线,使得该中心线几乎与旋转台8的轴线重叠。旋转调节后的X射线多角晶体7时,连续产生布拉格反射,并且可以通过由X射线检测器9捕获的反射强度曲线来确定布拉格角的位置。版权所有:(C)2003 ,日本特许厅

著录项

  • 公开/公告号JP2003057023A

    专利类型

  • 公开/公告日2003-02-26

    原文格式PDF

  • 申请/专利权人 JAPAN SCIENCE & TECHNOLOGY CORP;

    申请/专利号JP20010246510

  • 发明设计人 CHO SHOI;

    申请日2001-08-15

  • 分类号G01B15/00;

  • 国家 JP

  • 入库时间 2022-08-22 00:14:23

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