RETICLE, AND RETICLE MANUFACTURING APPARATUS, RETICLE INSPECTING APPARATUS, AND RETICLE STORAGE CONTAINER AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a reticle structure to prevent the infiltration of impurities including oxygen and moisture into a pellicle space of a reticle and to provide manufacturing means, storing means, inspecting means and exposing means for the same.;SOLUTION: In a manufacturing stage of the reticle, inert gas is sealed under the pressure higher than ambient pressure into the pellicle space and the reticle is stored in a pressure vessel so as to maintain this state. In inspecting the reticle, the reticle is inspected by adjusting the air pressure of an inspection space based on the pressure of the pellicle. In the exposure device, the reticle is exposed by adjusting the air pressure in the exposure space during exposure based on the pressure of the pellicle.;COPYRIGHT: (C)2003,JPO