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Planar geometry buried junction infrared detector and focal plane array

机译:平面几何掩埋式红外探测器和焦平面阵列

摘要

The described embodiments of the present invention include a method for forming a radiation detector, including the steps of: forming a radiation absorption layer on a substrate; forming a wider bandgap layer on the radiation absorption layer; forming a passivation layer on the wider bandgap layer; forming a doping layer on the passivation layer; patterning the doping layer; driving dopant from the patterned doping layer into the junction layer and the radiation absorption layer to form a doped region; patterning the passivation layer to expose the doped region; and forming an electrical contact to the doped region. ;Another described embodiment of the present invention is a radiation detector. This embodiment includes a radiation absorption layer formed on a substrate and a wider bandgap layer formed on the radiation absorption layer. This embodiment further includes a passivation layer formed on the junction layer; a patterned doping layer formed on the passivation layer and a doped region formed by driving dopant from the patterned doping layer into the junction layer and the radiation absorption layer and an electrical contact formed through a via in the passivation layer to provide electrical contact with the doped region.
机译:本发明的所描述的实施例包括一种用于形成放射线检测器的方法,包括以下步骤:在基板上形成放射线吸收层;以及在基板上形成放射线吸收层。在辐射吸收层上形成较宽的带隙层;在较宽的带隙层上形成钝化层;在钝化层上形成掺杂层;图案化掺杂层;将掺杂剂从图案化的掺杂层驱动到结层和辐射吸收层中以形成掺杂区;对钝化层进行构图以暴露掺杂区;形成与掺杂区的电接触。 ;本发明的另一个描述的实施例是辐射探测器。该实施例包括形成在基板上的辐射吸收层和形成在辐射吸收层上的较宽的带隙层。本实施例还包括形成在结层上的钝化层;形成在钝化层上的图案化掺杂层和通过将掺杂剂从图案化掺杂层驱动到结层和辐射吸收层中而形成的掺杂区域以及在钝化层中通过通孔形成以提供与掺杂物的电接触的电接触。地区。

著录项

  • 公开/公告号US2003071221A1

    专利类型

  • 公开/公告日2003-04-17

    原文格式PDF

  • 申请/专利权人 LOCKHEED MARTIN CORPORATION;

    申请/专利号US20010976559

  • 发明设计人 PRADIP MITRA;

    申请日2001-10-12

  • 分类号G01T1/24;

  • 国家 US

  • 入库时间 2022-08-22 00:11:46

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