Systems and methods for reducing contaminants in a charged-particle-beam microlithography system

摘要

Systems and methods are disclosed for reducing contaminants that can accumulate in a charged-particle-beam (CPB) microlithography system during use of the system for CPB microlithography. In general, the disclosed systems utilize a photocatalytic layer disposed on the walls of a vacuum chamber enclosing a CPB optical system of the microlithography system or on the surfaces of one or more components of the CPB optical system in the vacuum chamber. When exposed to a particular radiation, the photocatalytic layer reacts with a reactant, such as water vapor or oxygen, to create hydroxy radicals and/or superoxide ions. The hydroxy radicals and superoxide ions decompose the hydrocarbon-type contaminants and produce volatile reaction products that can be exhausted from the vacuum chamber. The systems and methods improve throughput of the CPB microlithography system because contaminants in the vacuum chamber are decomposed and removed in situ without having to disassemble and clean the microlithography system.