Microchip having grayscale and micromachined features and single mask process for patterning same

摘要

A microchip is provided having a grayscale feature and a micromachined alignment feature registered to the grayscale feature. A process is also provided to ensure proper registration between the alignment feature and the grayscale feature by using a single exposure mask to define the grayscale feature and the alignment feature. In particular, the exposure mask includes a grayscale pattern representing the grayscale feature and an alignment pattern representing an alignment feature located at a specified position with respect to the grayscale pattern. The alignment pattern in the exposure mask marks the location of the micromachined feature in the microchip. Through a multistep deposition and etching process, the grayscale feature is formed within the substrate along with a micromachined alignment feature to enable the microchip to be mechanically aligned to other components of an optical system while maintaining proper registration of the grayscale feature.