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Low leakage PMOS on-chip decoupling capacitor cells compatible with standard CMOS cells

机译:与标准CMOS单元兼容的低泄漏PMOS片上去耦电容器单元

摘要

An on-chip decoupling capacitor cell is disclosed that is compatible with standard CMOS cells. A cell boundary defining the area of the cell includes a first transistor area and a second transistor area. A PMOS transistor having an n-well is formed within the first transistor area. The on-chip decoupling capacitor cell further includes an n-well extension that extends the n-well into the second transistor area, thereby providing a decoupling capacitor cell having reduced leakage compared to a CMOS capacitor cell, and increased capacitance per unit area compare with a traditional PMOS capacitor cell.
机译:公开了与标准CMOS单元兼容的片上去耦电容器单元。定义单元区域的单元边界包括第一晶体管区域和第二晶体管区域。在第一晶体管区域内形成具有n阱的PMOS晶体管。片上去耦电容器单元还包括n阱延伸部,该n阱延伸部将n阱延伸到第二晶体管区域中,从而提供了与CMOS电容器单元相比具有减小的泄漏并且与之相比增加的单位面积电容的去耦电容器单元。传统的PMOS电容器单元。

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