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Method of manufacturing a semiconductor device, having first and second semiconductor regions with field shield isolation structures and a field oxide film covering a junction between semiconductor regions
Method of manufacturing a semiconductor device, having first and second semiconductor regions with field shield isolation structures and a field oxide film covering a junction between semiconductor regions
A semiconductor device has, in one embodiment, two wells of different conductivity types formed in a semiconductor substrate. The two wells are arranged to be adjacent to each other to form a junction therebetween. A field oxide film is formed to cover the junction at a main surface of the semiconductor substrate. Other field oxide films or field-shield isolation structures may be formed to isolate circuit elements from one another in the wells.
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