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Design method and system for providing transistors with varying active region lengths
Design method and system for providing transistors with varying active region lengths
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机译:提供具有变化的有源区长度的晶体管的设计方法和系统
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摘要
A method (40) of designing a circuit comprising a plurality of transistors (10, 46T, 60T). Each transistor of the plurality of transistors comprises an active region, a gate (G1, G2), a first source/drain (S/D1, S/D3) in the active region, a second source/drain in the active region, and at least one contact in each of the first source/drain and the second source/drain. The method comprises various steps. The method specifies a first set of distances for each transistor in a first set (10) of transistors in the plurality of transistors, wherein the first set of distances comprises a gate length (Lg), a gate width (Wg), and a distance representative of one or both of a first contact-to-edge distance (CTE1) and a first contact-to-gate distance (CTG1). The method also specifies (46) a second set of distances for each transistor in a second set (46T, 60T) of transistors in the plurality of transistors, wherein the second set of distances comprises a gate length (Lg), a gate width (Wg), and a distance representative of one or both of a second contact-to-edge distance (CTE2) and a second contact-to-gate distance (CTG2). For the method specifications, either or both the second contact-to-edge distance is greater than the first contact-to-edge distance and the second contact-to-gate distance is greater than the first contact-to-gate distance. Also for the method specifications, for each transistor in the second set of transistors, the step of specifying a second set of distances is responsive to a determination (44, 48) of a benefit from a larger drive current to be provided by the transistor in the second set of transistors.
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机译:一种设计包括多个晶体管( 10,46 B> T Sub> ,60 B> < Sub> T Sub>)。多个晶体管中的每个晶体管包括有源区,栅极(G 1 Sub>,G 2 Sub>),第一源极/漏极(S / D 1 < / Sub>,S / D 3 Sub>),有源区域中的第二源极/漏极以及第一源极/漏极和第二源极/漏极中的至少一个触点。该方法包括各种步骤。该方法为多个晶体管中的第一组晶体管( 10 B>)中的每个晶体管指定第一组距离,其中第一组距离包括栅极长度(L g < / Sub>),浇口宽度(W g Sub>)以及代表第一触点到边缘距离(CTE 1 Sub>)和第一次接触到门的距离(CTG 1 Sub>)。该方法还为第二组( 46 B> T Sub> ,60 B>中的每个晶体管指定( 46 B>)第二组距离。多个晶体管中的晶体管的B> T Sub>),其中第二组距离包括栅极长度(L g Sub>),栅极宽度(W g Sub>),以及代表第二个接触到边缘距离(CTE 2 Sub>)和第二个接触到栅极距离(CTG 2 < / Sub>)。对于方法规范,第二接触点到边缘的距离之一或两者都大于第一接触点到边缘的距离,并且第二接触点到栅极的距离大于第一接触点到栅极的距离。同样对于方法规范,对于第二组晶体管中的每个晶体管,指定第二组距离的步骤是响应于确定( 44、48 B>)受益于较大驱动电流的步骤由第二组晶体管中的晶体管提供。
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