;wherein each R group represents an alkyl group which may be the same or different, and each X group is independently a fluorine or hydrogen. The compound (I) is particularly useful as an initiator in a photosensitive composition containing a polyimide precursor, which is curable under patternwise low radiation exposure to give a patterned layer having heat and chemical resistance."/>
公开/公告号US6524770B1
专利类型
公开/公告日2003-02-25
原文格式PDF
申请/专利权人 HITACHI CHEMICAL CO. LTD.;
申请/专利号US20000663370
申请日2000-09-15
分类号G03F70/04;
国家 US
入库时间 2022-08-22 00:05:29