embedded image;wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C."/> Copolymer for improving the chemical and developer resistance of positive working printing plates
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Copolymer for improving the chemical and developer resistance of positive working printing plates

机译:用于改善阳图印刷版的耐化学药品和显影剂性能的共聚物

摘要

Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and C embedded image;wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.
机译:可用于印刷版辐射敏感层的共聚物具有单元A,B和C。<化学编号=“ CHEM-US-00001”> <图像alt =“嵌入式图像” file =“ US06525152-20030225-C00001.GIF” =“ 259.2324” imgContent =“未定义” imgFormat =“ GIF” wi =“ 151.4457” /> ;其中单元A的存在量为5到最大50 mol选择%和R 1 和R 4 ,使得A的均聚物是碱溶性的,B的存在量为20-70mol%,R 2 ,R 6 和R 7 使得B的均聚物具有较高的玻璃化转变温度,并且C的含量为10选择-50 mol%和R 3 和R 5 ,使得C的均聚物是水溶性的并且单元A是d从C单元传来。

著录项

  • 公开/公告号US6525152B1

    专利类型

  • 公开/公告日2003-02-25

    原文格式PDF

  • 申请/专利权人 KODAK POLYCHROME GRAPHICS LLC;

    申请/专利号US20000630917

  • 发明设计人 MATHIAS JAREK;

    申请日2000-08-02

  • 分类号C08F2224/00;C08F1224/00;G03F70/23;

  • 国家 US

  • 入库时间 2022-08-22 00:05:19

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