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Method to improve accuracy of model-based optical proximity correction
Method to improve accuracy of model-based optical proximity correction
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机译:一种提高基于模型的光学邻近校正精度的方法
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摘要
The disclosure describes an exemplary method of improving the accuracy of model-based optical proximity correction (OPC). This method can include identifying best exposure dose and best focus conditions, measuring critical dimensions at the identified conditions, measuring critical dimensions at variations from the identified conditions, and obtaining critical dimension information by averaging measured critical dimensions.
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