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Vertical cavity surface emitting laser with oxidized strain-compensated superlattice of group III-V semiconductor

机译:垂直腔表面发射激光器,具有III-V族半导体的氧化应变补偿超晶格

摘要

A vertical cavity surface emitting laser that includes a Group III-V semiconductor material substrate; a first Distributed Bragg Reflector mirror, where the first Distributed Bragg Reflector mirror includes at least seven pairs of layers, where each layer has a different index of refraction, where one of the layers is a Group III-V semiconductor material, and where the other layer is a completely oxidized at least one strain-compensated superlattice of Group III-V semiconductor material, where each at least one strain-compensated superlattice includes at least two monolayers of a Group III-V semiconductor material and at least two monolayers of an aluminum-bearing Group III-V semiconductor material; a first Group III-V semiconductor material layer; a first contact; a selectively oxidized at least one strain-compensated superlattice of Group III-V semiconductor material, where each at least one strain-compensated superlattice of Group III-V semiconductor material includes at least two monolayers of a Group III-V semiconductor material and at least two monolayers of an aluminum-bearing Group III-V semiconductor material; a second Group III-V semiconductor material layer; a second contact; and a second Distributed Bragg Reflector mirror that is identical to the first Distributed Bragg Reflector mirror.
机译:一种垂直腔表面发射激光器,包括III-V族半导体材料衬底;第一分布式布拉格反射镜,其中第一分布式布拉格反射镜包括至少七对层,其中每一层具有不同的折射率,其中一层是III-V族半导体材料,另一层层是被完全氧化的至少一个III-V族半导体材料的应变补偿超晶格,其中每个至少一个应变补偿的超晶格包括至少两个III-V族半导体材料的单层和至少两个铝的单层-含III-V族的半导体材料;第一III-V族半导体材料层;第一次接触;选择性氧化的至少一种III-V族半导体材料的应变补偿超晶格,其中每个至少一种III-V族半导体材料的应变补偿超晶格包括至少两个III-V族半导体材料的单层和至少含铝的III-V族半导体材料的两个单层;第二III-V族半导体材料层;第二次接触;第二个分布式布拉格反射镜与第一个分布式布拉格反射镜相同。

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