HIGHLY PURE ULTRA-FINE SiOX POWDER AND METHOD FOR PRODUCTION THEREOF

摘要

PROBLEM TO BE SOLVED: To produce highly pure and superfine SiOx (x=0.6 to 1.8) powder in which specific surface area is ≥10 m²/g, and the total content of Na, Fe, Al and Cl is ≤10 ppm.;SOLUTION: Gaseous monosilane and an oxidizing gas of the gaseous monosilane are reacted at 500 to 1,000°C in a nonoxidizing atmosphere under the pressure of 10 to 1,000 kPa, so that the highly pure and superfine SiOx (x=0.6 to 1.8) powder in which specific surface area is ≥10 m²/g, and the total content of Na, Fe, Al and Cl is ≤10 ppm can be produced. In this case, the content of the nonoxidizing gas is preferably made higher than the total content of the amounts of oxygen used for the oxidation reaction of the gaseous monosilane and the oxidizing gas of the gaseous monosilane.;COPYRIGHT: (C)2003,JPO