HIGHLY PURE ULTRA-FINE SiOX POWDER AND METHOD FOR PRODUCTION THEREOF

摘要

A highly pure ultra-fine SiOX powder, characterized in that it is represented by the formula: wherein x is 0.6 to 1.8, has a specific surface area of 10 m2/g or more and contains Na, Fe, Al and Cl in a total amount of 10 ppm or less; and a method for producing the above SiOX powder which comprises reacting a monosilane gas with a gas capable of oxidizing the monosilane gas in a non-oxidizing gas atmosphere under a pressure of 10 to 1000 kPa at 500 to 1000˚C. The amount of the non-oxidizing gas is preferably greater than that of the sum of the monosilane gas and oxygen participating in the oxidation of the monosilane gas.