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Highly pure ultra-fine SiOx powder and method for production thereof
Highly pure ultra-fine SiOx powder and method for production thereof
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机译:高纯超细SiOx粉末及其生产方法
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摘要
A highly pure ultra-fine SiOx (wherein x is from 0.6 to 1.8) powder having a specific surface area of at least 10 m2/g and a total content of Na, Fe, Al and Cl of at most 10 ppm is provided. The SiOx powder is produced by reacting a monosilane gas with a gas capable of oxidizing the monosilane gas in a non-oxidizing gas atmosphere under a pressure of from 10 to 1000 kPa at a temperature of from 500 to 1000° C. In this case, the amount of the non-oxidizing gas is preferably larger than the total amount of the monosilane gas and oxygen participating in the oxidation of the gas capable of oxidizing the monosilane gas.
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机译:一种比表面积至少为10 m 2 Sup> / g且Na,Fe,Al和Cl的总含量至少为10的高纯度超细SiOx(其中x为0.6至1.8)粉末。最多提供10 ppm。 SiOx粉末是通过使甲硅烷气体与能够在非氧化性气体气氛中在10至1000 kPa的压力下于500至1000℃的温度下氧化甲硅烷气体的气体反应而制得的。在这种情况下,非氧化性气体的量优选大于甲硅烷气体和参与能够氧化甲硅烷气体的气体的氧化的氧气的总量。
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