首页> 外国专利> Vacuum distillation method and apparatus for enhanced purification of high-purity metals like indium

Vacuum distillation method and apparatus for enhanced purification of high-purity metals like indium

机译:真空蒸馏方法和装置,用于增强提纯铟等高纯度金属

摘要

A 99.99% pure indium feed is charged into crucible 8 and heated to 1250 °C by upper heater 6 in a vacuum atmosphere at 1 x 10-4 Torr, whereupon indium evaporates, condenses on the inner surfaces of inner tube 3 and drips to be recovered into liquid reservoir 9 in the lower part of tubular member 11 whereas impurity elements having lower vapor pressure than indium stay within crucible 8. The recovered indium mass in liquid reservoir 9 is heated to 1100 °C by lower heater 7 and the resulting vapors of impurity elements having higher vapor pressure than indium pass through diffuser plates 12 in the upper part of tubular member 11 to be discharged from the system whereas the indium vapor recondenses upon contact with diffuser plates 12 and returns to liquid reservoir 9, yielding 99.9999% pure indium while preventing the loss of indium.
机译:将纯度为99.99%的铟原料装入坩埚8中,并由上部加热器6在1 x 10-4托的真空气氛中通过上部加热器6加热至1250°C,随后铟蒸发,在内管3的内表面冷凝并滴落成坩埚8内的杂质元素的蒸气压比铟低,杂质被残留在坩埚8内。在下部的加热器7中,回收的铟块被下部加热器7加热至1100℃,所得到的蒸气蒸气压比铟高的杂质元素通过管状部件11上部的扩散板12从系统中排出,而铟蒸气在与扩散板12接触时重新冷凝并返回储液罐9,产生99.9999%的纯铟同时防止铟的损失。

著录项

  • 公开/公告号EP1335032A1

    专利类型

  • 公开/公告日2003-08-13

    原文格式PDF

  • 申请/专利权人 DOWA MINING CO. LTD.;

    申请/专利号EP20020002879

  • 发明设计人 TAYAMA KISHIO;HODOZUKA TOSHIAKI;

    申请日2002-02-08

  • 分类号C22B58/00;C22B9/02;C22B9/04;C22B19/16;C22B19/18;C22B17/06;

  • 国家 EP

  • 入库时间 2022-08-21 23:49:16

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号