PHOTOMASK METHOD OF PRODUCING PHOTOMASK AND METHOD OF MAKING PATTERN USING PHOTOMASK

摘要

It is a light-shielding film region 101 and the phase shift region 102 on the transparent substrate 100 where the mask the light-shielding pattern is formed consisting isolated. A phase shift region 102 has a phase difference with respect to the light transmitting region of the transparent substrate 100. Further, the width of the phase shift region 102 is set so that they are at approximately light-shielding effect of the phase shift region 102 as compared to the light-shielding performance of the light-shielding film having the same width.