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-// Ni-W/Mo/Lanthanide mixed-rare earth metal electroless plating solution and plating method using the same

机译:-// Ni-W / Mo /镧系元素混合稀土金属化学镀液及其使用方法

摘要

PURPOSE: Ni-W/Mo/Lanthanide mixed-rare earth metal electroless plating solution and a plating method using the same are provided. CONSTITUTION: The Ni-W/Mo/Lanthanide mixed-rare earth metal electroless plating solution contains, in 1 liter of distilled water, nickel sulfate 5 to 15g, sodium tungstate 20 to 35g, molybdenum 25 to 35g, Lanthanide mixed-rare earth metal 0.1 to 5g, sodium citrate 10 to 15g, sodium hypophosphate 5 to 10g and molybdenum ionic surfactant 0.7 to 2.0g/25cc, wherein the ionic surfactant is dioctyl phthalate+phthyl cellosolve; the diameter is molybdenum is 0.1 to 1.0 micrometer; the diameter of Lanthanide mixed-rare earth metal is 0.1 to 2.3 micrometer. The plating method using Ni-W/Mo/Lanthanide mixed-rare earth metal electroless plating solution includes the steps of completely dissolving nickel sulfate 5 to 15g, sodium tungstate 20 to 35g in 1 liter of distilled water; secondary dissolving sodium citrate 10 to 15g, sodium hypophosphate 5 to 10g in the distilled water; adding 25 to 35g of molybdenum with a particle size of 0.1 to 1.0 micrometer, 0.1 to 5g of Lanthanide mixed-rare earth metal with a particle size of 0.1 to 2.3 micrometer and 0.7 to 2.0g/25cc of molybdenum ionic surfactant in the distilled water; electroplating a specimen to be plated in a thickness of 7 to 10 micrometers at pH 9.0 to 9.8 at electroplating solution temperature of 85 to 90C; and heat treatment at 350 to 450C for about 30 min.
机译:目的:提供Ni-W / Mo /镧系元素混合稀土金属化学镀液和使用其的镀覆方法。组成:Ni-W / Mo / Lanthanide混合稀土金属化学镀液在1升蒸馏水中包含5至15g硫酸镍,20至35g钨酸钠,25至35g钼,镧系混合稀土金属0.1-5g,柠檬酸钠10-15g,次磷酸钠5-10g和钼离子表面活性剂0.7-2.0g / 25cc,其中离子表面活性剂为邻苯二甲酸二辛酯+邻苯二甲酸溶纤剂;钼的直径为0.1至1.0微米;镧系混合稀土金属的直径为0.1至2.3微米。使用Ni-W / Mo /镧系元素混合稀土金属化学镀液的镀覆方法包括以下步骤:将5至15g的硫酸镍,20至35g的钨酸钠完全溶解在1升蒸馏水中。在蒸馏水中二次溶解柠檬酸钠10至15g,次磷酸钠5至10g;在蒸馏水中加入25至35克粒径为0.1至1.0微米的钼,0.1至5克粒径为0.1至2.3微米的镧系混合稀土金属和0.7至2.0克/ 25 cc钼离子表面活性剂;在85至90℃的电镀液温度下,在pH 9.0至9.8下电镀厚度为7至10微米的待镀样品;并在350至450℃下热处理约30分钟。

著录项

  • 公开/公告号KR20030039708A

    专利类型

  • 公开/公告日2003-05-22

    原文格式PDF

  • 申请/专利权人 EOM TAE IN;

    申请/专利号KR20010070734

  • 发明设计人 EOM TAE IN;KANG YONG HYEOK;

    申请日2001-11-14

  • 分类号C23C18/32;

  • 国家 KR

  • 入库时间 2022-08-21 23:47:05

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