METHOD OF MANUFACTURING PHOTONIC CRYSTAL MASK METHOD OF MANUFACTURING MASK AND METHOD OF MANUFACTURING OPTICAL DEVICE

摘要

PURPOSE: A method for manufacturing a photonic crystal, a mask, a mask manufacturing method, and an optical device manufacturing method are provided to be capable of reducing the number of parts and removing the necessity of optical axis alignment. CONSTITUTION: A mask(8) is used for forming a photonic crystal. The mask includes a mask substrate(1) and a plurality of through holes(2) formed at the mask substrate. The mask substrate is defined with the first to n-th mask region(6,7). The through holes transmit predetermined ion beams(11). The array, size, and shape of the through holes, are different according to the first to n-th mask region. The other region of the mask substrate except the holes, is used for blocking the ion beams.