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Reaction gas suppling apparatus for semiconductor processing and its clogging test methods to test an injection valve clogged up reaction gas

机译:用于半导体处理的反应气体供给装置及其堵塞测试方法,用于测试喷射阀堵塞的反应气体

摘要

PURPOSE: A semiconductor manufacturing reaction gas supply apparatus capable of detecting the clogging state of an injection valve and a method for detecting the clogging state are provided to be capable of selectively and exactly discriminating whether each injection valve is clogged or not by installing pressure sensing parts at one side of each reaction gas supply part. CONSTITUTION: Carrier gas is supplied from a carrier gas supply part(100). A plurality of reaction gas supply parts are installed and bridged from the carrier gas supply part(100) for supplying reaction gases to a chamber(500) using the carrier gas. At this time, a predetermined layer is formed on a semiconductor device by the supplied reaction gases in the chamber(500). A plurality of pressure sensing parts are installed between the carrier gas supply part(100) and the reaction gas supply parts for sensing the supply pressure of the carrier gas. Preferably, the pressure sensing parts include mass flow meters(200,300,400), respectively.
机译:目的:提供一种能够检测喷射阀的堵塞状态的半导体制造反应气体供应装置和一种用于检测堵塞状态的方法,以能够通过安装压力感测部件来选择性地和准确地识别每个喷射阀是否堵塞。在每个反应气体供应部分的一侧。组成:载气是从载气供应部分(100)供应的。从载气供应部(100)安装并桥接多个反应气供应部,以使用载气将反应气供应到腔室(500)。此时,通过腔室(500)中供应的反应气体在半导体器件上形成预定层。在载气供应部分(100)和反应气体供应部分之间安装有多个压力感测部分,用于感测载气的供应压力。优选地,压力感测部分分别包括质量流量计(200,300,400)。

著录项

  • 公开/公告号KR20030048622A

    专利类型

  • 公开/公告日2003-06-25

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20010078578

  • 发明设计人 LEE SEUNG U;LIM MIN GYU;

    申请日2001-12-12

  • 分类号H01L21/00;

  • 国家 KR

  • 入库时间 2022-08-21 23:46:54

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