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Reaction gas suppling apparatus for semiconductor processing and its clogging test methods to test an injection valve clogged up reaction gas
Reaction gas suppling apparatus for semiconductor processing and its clogging test methods to test an injection valve clogged up reaction gas
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机译:用于半导体处理的反应气体供给装置及其堵塞测试方法,用于测试喷射阀堵塞的反应气体
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摘要
PURPOSE: A semiconductor manufacturing reaction gas supply apparatus capable of detecting the clogging state of an injection valve and a method for detecting the clogging state are provided to be capable of selectively and exactly discriminating whether each injection valve is clogged or not by installing pressure sensing parts at one side of each reaction gas supply part. CONSTITUTION: Carrier gas is supplied from a carrier gas supply part(100). A plurality of reaction gas supply parts are installed and bridged from the carrier gas supply part(100) for supplying reaction gases to a chamber(500) using the carrier gas. At this time, a predetermined layer is formed on a semiconductor device by the supplied reaction gases in the chamber(500). A plurality of pressure sensing parts are installed between the carrier gas supply part(100) and the reaction gas supply parts for sensing the supply pressure of the carrier gas. Preferably, the pressure sensing parts include mass flow meters(200,300,400), respectively.
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