A METHOD OF CLEANING VACUUM CHAMBER FOR SURFACE PROCESS OF ORGANIC INSULATING LAYER AND A METHOD OF FABRICATING A LIQUID CRYSTAL DISPLAY DEVICE USING THEREOF

摘要

PURPOSE: A method for cleaning a vacuum chamber for processing the surface of an organic insulating layer and a method for fabricating a liquid crystal display using the cleaning method are provided to continuously process the surface of an organic passivation layer without interrupting processes. CONSTITUTION: A gas is filled in a vacuum chamber(30) having organic impurities(39) deposited on the inner wall of the chamber. RF power is applied to the vacuum chamber to make plasma from the gas to collide plasma ions with the organic impurities on the inner wall of the vacuum chamber, to generate impurity gases. The impurity gases are exhausted. The impurities are carbon compounds and impurity gases include CO, CO2 and SF4.