A process for the preparation of a thermally stable layer system for the reflection of radiation in the extreme ultraviolet spectral range (euv)

摘要

Thermally stable layer system consists of a number of thin layer pairs lying over each other on a substrate, each layer comprising a molybdenum and a silicon layer with a barrier layer of molybdenum silicide between them. Preferred Features: The number of layer pairs is in the region of 40-60. One layer pair has a thickness of 6.8 nm. The barrier layer is 0.7 nm thick. The layers are applied by PVD.