A combined coating method magnetic field-assisted high performance - pulse - cathode sputtering and unbalanced magnetron, so that

摘要

A pvd - a method for the coating of substrates, wherein the substrate in the vapor of a pulsed magnet field is pretreated supported cathode sputtering, while the pretreatment for the magnetic field a magnetic field arrangement of the type of the magnetron cathode is used with a thickness of the horizontal component in front of the target of 100 to 1500 gauss, after the pretreatment, a further coating takes place by means of cathode sputtering and the power density of the pulsed discharge in the pretreatment over 1000 w been cm cm · - 2 · is.