首页> 外国专利> Surface evaluation of semiconductors and conductors using microwave analysis, whereby the source is moved relative to the surface being examined and Doppler principles applied to increase the inspection speed

Surface evaluation of semiconductors and conductors using microwave analysis, whereby the source is moved relative to the surface being examined and Doppler principles applied to increase the inspection speed

机译:使用微波分析对半导体和导体进行表面评估,从而使光源相对于要检查的表面移动,并采用多普勒原理来提高检查速度

摘要

Method for analysis of a surface (6) using microwaves, whereby microwaves are transmitted towards (11) the surface and reflected or back-scattered from it so that they can be analyzed to make conclusions about the surface, e.g. its level of corrosion. To increase the area of a surface that can be analyzed the microwave source is moved relative to the surface. A Doppler treatment of the results is applied with the results normalized so that they are independent of the relative movement speed.
机译:使用微波分析表面(6)的方法,其中微波被传向表面(11)并从表面反射或反向散射,以便可以对它们进行分析以得出有关表面的结论,例如其腐蚀程度。为了增加可以被分析的表面的面积,使微波源相对于该表面移动。对结果进行多普勒处理,并对结果进行归一化,使其与相对运动速度无关。

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