首页> 外国专利> New bis-o-aminophenol derivatives useful for preparation of poly-o-hydroxyamide and polybenzoxazole compounds used as dielectric or buffer coatings in microelectronic structural parts and in the production of photosensitive compositions

New bis-o-aminophenol derivatives useful for preparation of poly-o-hydroxyamide and polybenzoxazole compounds used as dielectric or buffer coatings in microelectronic structural parts and in the production of photosensitive compositions

机译:新的双邻氨基苯酚衍生物,可用于制备聚邻羟基酰胺和聚苯并恶唑化合物,用作微电子结构部件中的介电或缓冲涂层以及光敏组合物的生产

摘要

Bis-o-aminophenol derivatives in which at least one of the phenolic hydroxy groups comprises a tert.-butoxycarbonyl group (I), are new. Bis-o-aminophenol derivatives in which at least one of the phenolic hydroxy groups comprises a tert.-butoxycarbonyl group of formula (I), are new. R3-R5 = H, F, -(CH2)n-CH3 or -(CF2)n-CF3 (not all H); and n = 0-10. Independent claims are also included for the following: (1) poly-o-hydroxyamide with t-butoxycarbonyl groups of formula (I), obtained by condensation of the bis-o-aminophenol derivatives with dicarboxylic acids or their activated derivatives; (2) polybenzoxazoles obtained from the poly-o-hydroxamides via cyclization; (3) photosensitive composition including at least the bis-o-aminophenol derivative and/or the poly-o-hydroxyamide, a photoacid and a solvent; (4) a microelectronic structural element including material based on the compound described above.
机译:新的双邻氨基苯酚衍生物是新的,其中至少一个酚羟基包含叔丁氧羰基(I)。是新的双邻氨基苯酚衍生物,其中至少一个酚羟基包含式(I)的叔丁氧羰基。 R 3 -R 5 = H,F,-(CH 2)n -CH 3或-(CF 2)n -CF 3(并非全部为H);并且n = 0-10。还包括以下方面的独立权利要求:(1)具有式(I)的叔丁氧羰基的聚-邻-羟基酰胺,其通过将双-邻-氨基苯酚衍生物与二元羧酸或其活化的衍生物缩合而获得; (2)通过环化作用从聚邻羟基苯甲酰胺获得的聚苯并恶唑; (3)感光性组合物,其至少包含双邻氨基苯酚衍生物和/或聚邻羟基酰胺,光酸和溶剂。 (4)一种微电子结构元件,其包括基于上述化合物的材料。

著录项

  • 公开/公告号DE10145463A1

    专利类型

  • 公开/公告日2003-05-22

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2001145463

  • 发明设计人 SEZI RECAI;

    申请日2001-09-14

  • 分类号C07C219/34;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:42

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