A method for automatic monitoring and analyzing by objective lenses focus variation of an exposure apparatus production errors caused

摘要

The method involves detecting machine-internal objective lens focusing data for the exposure system in real time for several wafers of at least one production lot, processing the data in real time with at least one algorithm in a computer, checking the processed data against a tolerance band for objective lens focusing fluctuations and outputting a warning signal and/or initiating automatic production termination for the relevant wafer. AN Independent claim is also included for the following: a computer for implementing the monitoring and analysis method.