Measuring structure for determining positioning accuracy of semiconductor wafer or exposure mask has reference structure and associated protection structures

摘要

The measuring structure (1) has a reference structure (2,2') positioned at or near the surface (6) of the semiconductor wafer or mask and at least 2 protection structures (3,3'',3''',4'',4''') at respective distances from the reference structure and positioned parallel or perpendicular to it. Each of the structures can be provided as a groove formed in the surface of the semiconductor wafer or mask, the protection structures having a width of less than the resolutiuon limit of the optical system used for determining the positioning accuracy.