首页> 外国专利> Semiconductor memory cell for flash memory, has memory gate configuration with multiple gate regions that are spatially separated from each other by insulation region

Semiconductor memory cell for flash memory, has memory gate configuration with multiple gate regions that are spatially separated from each other by insulation region

机译:用于闪存的半导体存储单元具有具有多个栅极区域的存储器栅极配置,该多个栅极区域在空间上通过绝缘区域彼此分隔开

摘要

A memory gate configuration has several gate regions (F1,F2) that are spatially separated from each other by an insulation region (110). Independent claims are also included for the following: (1) semiconductor memory device; and (2) method for fabricating semiconductor memory cell.
机译:存储器栅极配置具有通过绝缘区域(110)在空间上彼此隔开的多个栅极区域(F1,F2)。还包括以下方面的独立权利要求:(1)半导体存储器件; (2)半导体存储单元的制造方法。

著录项

  • 公开/公告号DE10153384A1

    专利类型

  • 公开/公告日2003-05-15

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2001153384

  • 发明设计人 MIKOLAJICK THOMAS;

    申请日2001-10-30

  • 分类号G11C16/04;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:32

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