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Quartz glass blank used for an optical component for transferring ultraviolet radiation in microlithography e.g. for the production of highly integrated circuits has a glass structure without oxygen defect sites
Quartz glass blank used for an optical component for transferring ultraviolet radiation in microlithography e.g. for the production of highly integrated circuits has a glass structure without oxygen defect sites
Quartz glass blank has a glass structure without oxygen defect sites, a hydrogen content of 3 x 1017 to 2.0 x 1018 molecules/cm3, a hydroxyl content of 500-1000 wt. ppm, a silicon hydrogen group content of less than 2 x 1017 molecules/cm3, a chlorine content of 60-120 wt. ppm, an inhomogenity in refractive index DELTA n of less than 2 ppm and voltage birefringence of less than 2 nm/cm. Preferred Features: The hydroxyl (OH) content is 600-900, preferably 750-950 wt. ppm. The hydrogen content is 5 x 1017 to 1.0 x 1018 molecules/cm3. The chlorine content is 80-100 wt. ppm.
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机译:石英玻璃毛坯具有无氧缺陷位点的玻璃结构,氢含量为3×10 17至2.0×10 18分子/ cm 3,羟基含量为500-1000重量%。 ppm,硅氢基含量小于2×10 17分子/ cm 3,氯含量为60-120wt。%。 ppm,折射率DELTA n的不均匀度小于2 ppm,电压双折射小于2 nm / cm。优选特征:羟基(OH)含量为600-900重量%,优选为750-950重量%。 ppm。氢含量为5×10 17至1.0×10 18分子/ cm 3。氯含量为80-100重量%。 ppm。
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