Process for cleaning an apparatus in which organic solvents containing (meth)acrylic acids are treated and/or produced, comprises rinsing the apparatus with (meth)acrylic acid, water, and finally with an aqueous solution of a basic salt

摘要

Process for cleaning an apparatus in which organic solvents containing (meth)acrylic acids are treated and/or produced comprises rinsing the apparatus initially with (meth)acrylic acid, then with water, and finally with an aqueous solution of a basic salt. Preferred Features: The apparatus is a rectification column, an adsorption column, a desorption column and/or an extraction column, or an evaporator or a heat exchanger. The aqueous solution of the basic salt is an aqueous solution of KOH and/or NaOH.