首页> 外国专利> Process for calibrating the temperature measuring system of a high temperature reactor comprises preparing a calibrating plate with a doping material, determining the thickness of the layer, thermally treating, and further processing

Process for calibrating the temperature measuring system of a high temperature reactor comprises preparing a calibrating plate with a doping material, determining the thickness of the layer, thermally treating, and further processing

机译:校准高温反应器的温度测量系统的方法包括准备带有掺杂材料的校准板,确定层的厚度,进行热处理以及进一步处理

摘要

Process for calibrating the temperature measuring system of a high temperature reactor comprises preparing a calibrating plate with a first concentration of doping material having a layer with a second concentration of the doping material, determining the thickness of the layer, thermally treating the calibrating plate in the reactor at a theoretical temperature measured by the temperature measuring system, determining the thickness of the layer again, and determining the actual temperature in the reactor during heat treatment from the difference of the thicknesses of the layer between the change of thickness of the layer and the temperature during heat treatment.
机译:校准高温反应器的温度测量系统的方法包括:制备具有第一浓度的掺杂材料的校准板,该校准板具有具有第二浓度的掺杂材料的层,确定该层的厚度,在该校准板中热处理该校准板。反应器在由温度测量系统测得的理论温度下,再次确定该层的厚度,并根据该层的厚度与温度的变化之间的层厚度之差确定热处理期间反应器中的实际温度。热处理过程中的温度。

著录项

  • 公开/公告号DE10216610A1

    专利类型

  • 公开/公告日2003-10-30

    原文格式PDF

  • 申请/专利权人 WACKER SILTRONIC AG;

    申请/专利号DE2002116610

  • 申请日2002-04-15

  • 分类号H01L21/20;F27B5/18;C23C16/00;H01L21/324;H01L21/22;C30B33/02;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:00

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