PATCH FOR PHOTOLITHOGRAPHY PROCESS CONTROL AND PHOTOLITHOGRAPHY PROCESS CONTROL METHOD, AND BACK-REST OF PLASMA DISPLAY PANEL FORMED WITH PATCH

摘要

PROBLEM TO BE SOLVED: To carry out easily and in a short time a determination whether or not a process condition in production in a photolithography process is suitable.;SOLUTION: In the photolithography process to form an electrode on the back-rest of a plasma display panel, this patch is used for photolithography process management and simultaneously formed of the same material as that of the electrode, and is constituted of a plurality of kinds of stripe patterns of which the widths and/or distances are different, or is formed by the exposure of a plurality of photomask patterns with different concentrations. Then, the photolithography process management method using that patch and the back-rest of a plasma display panel formed with the patch are also obtained.;COPYRIGHT: (C)2004,JPO&NCIPI