首页> 外国专利> ELECTRON BEAM FOCUS CONTROLLING APPARATUS, POSTURE CONTROLLING APPARATUS FOR ELECTRON BEAM IRRADIATION HEAD, METHOD FOR CONTROLLING ELECTRON BEAM FOCUS, AND METHOD FOR CONTROLLING POSTURE OF ELECTRON BEAM IRRADIATION HEAD

ELECTRON BEAM FOCUS CONTROLLING APPARATUS, POSTURE CONTROLLING APPARATUS FOR ELECTRON BEAM IRRADIATION HEAD, METHOD FOR CONTROLLING ELECTRON BEAM FOCUS, AND METHOD FOR CONTROLLING POSTURE OF ELECTRON BEAM IRRADIATION HEAD

机译:电子束焦点控制装置,电子束照射头的姿势控制装置,电子束焦点的控制方法以及电子束照射头的姿势的控制方法

摘要

PROBLEM TO BE SOLVED: To keep a just-focus state and to control fluctuation of the posture of a static pressure floating pad.;SOLUTION: The electron beam irradiation apparatus is equipped with: an electron lens 20 for adjusting the focus and an objective electron lens 21 which converge the electron beam in an electron gun 2; an elastic linking mechanism 5 which elastically links the static pressure floating pad 6; a displacement sensor which detects the displacement amount of the center of the static pressure floating pad 6 in the vertical direction with respect to a master disk 11; and a host side controlling unit and an electron gun side controlling unit which control the focus of the electron beam in accordance with the position of the static pressure floating pad 6 when the pad 6 rises in a non-contact state leaving a specified gap to the master disk 11, by converging the electron beam in the electron gun 2 by means of the electron lens 20 for adjusting the focus and of the objective electron lens 21 depending on the displacement amount detected by the displacement sensor.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:保持正焦状态并控制静压浮动垫的姿态波动。解决方案:电子束照射设备配备:用于调节焦点和物镜电子的电子透镜20透镜21在电子枪2中会聚电子束。弹性连接机构5,其弹性地连接静压浮垫6。位移传感器检测静压浮垫6的中心在垂直方向上相对于母盘11的位移量;主机侧控制单元和电子枪侧控制单元,当在焊盘6以非接触状态上升时,根据静压浮动焊盘6的位置控制电子束的聚焦,从而与焊盘之间留有规定的间隙。母盘11,通过根据位移传感器检测到的位移量通过用于调节焦点的电子透镜20和物镜21在电子枪2中会聚电子束。版权所有:(C)2004 ,JPO&NCIPI

著录项

  • 公开/公告号JP2004258379A

    专利类型

  • 公开/公告日2004-09-16

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20030049607

  • 发明设计人 MIURA YOSHIHISA;MUTO KOICHI;

    申请日2003-02-26

  • 分类号G03F7/20;G03F9/02;G11B7/26;G21K5/04;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 23:35:35

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