首页> 外国专利> DISCHARGE PLASMA TREATMENT METHOD AND DISCHARGE PLASMA TREATMENT DEVICE USING THE SAME

DISCHARGE PLASMA TREATMENT METHOD AND DISCHARGE PLASMA TREATMENT DEVICE USING THE SAME

机译:放电等离子体处理方法及使用该方法的放电等离子体处理装置

摘要

PROBLEM TO BE SOLVED: To stably treat a long substrate to be treated by introducing a treating gas at a prescribed flow rate only into the space between a pair of opposed electrodes whose opposed surfaces are convex.;SOLUTION: The surfaces of a pair of fixed electrodes 2, 3 arranged opposite to each other in the vertical direction are coated with a fixed dielectric substance 7, 8 and a discharge space 4 is formed between them. A gas supply nozzle 5 and a gas exhaust nozzle 6 are disposed on both sides of the discharge space and a treating gas is blown from the outlet of the gas supply nozzle 5 into the discharge space 4 in an arrow direction at a prescribed rate (preferably about 1-50 m/sec, more preferably 2-20 m/sec). When an electric field is applied from a power source 1 between the electrodes 2, 3, the treating gas is converted to plasma in the discharge space 4 to treat the surface of a substrate 10 to be treated during transport between the electrodes 2, 3.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:通过将处理气体以规定的流量仅引入到一对相对电极之间的空间来稳定地处理长的被处理基板,所述一对相对电极的相对表面是凸形的;解决方案:一对固定的表面在垂直方向上彼此相对布置的电极2、3涂覆有固定的介电物质7、8,并且在它们之间形成放电空间4。在排出空间的两侧配置有气体供给喷嘴5和气体排出喷嘴6,将处理气体从气体供给喷嘴5的出口沿箭头方向以规定比例(优选为箭头方向)吹入排出空间4内。 (约1-50 m / sec,更优选2-20 m / sec)。当从电源1在电极2、3之间施加电场时,在放电空间4中,处理气体被转换成等离子体,以在电极2、3之间的传输过程中处理待处理的基板10的表面。 ;版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004089859A

    专利类型

  • 公开/公告日2004-03-25

    原文格式PDF

  • 申请/专利权人 SEKISUI CHEM CO LTD;

    申请/专利号JP20020254620

  • 发明设计人 IWANE KAZUYOSHI;

    申请日2002-08-30

  • 分类号B01J19/08;C08J7/00;C23C16/455;H05H1/24;

  • 国家 JP

  • 入库时间 2022-08-21 23:33:29

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