首页> 外国专利> METHOD OF MANUFACTURING ARRAY WAVEGUIDE DIFFRACTION GRATING ELEMENT AND ARRAY WAVEGUIDE DIFFRACTION GRATING ELEMENT

METHOD OF MANUFACTURING ARRAY WAVEGUIDE DIFFRACTION GRATING ELEMENT AND ARRAY WAVEGUIDE DIFFRACTION GRATING ELEMENT

机译:阵列波导衍射光栅元件的制造方法

摘要

PROBLEM TO BE SOLVED: To realize a method of manufacturing array waveguide diffraction grating element, which can easily realize wavelength compensation and to realize an array waveguide diffraction grating element.;SOLUTION: An array waveguide diffraction grating element 61C comprises three chips of; a first AWG chip 1211; a second AWG chip 1212 made to adhere to the fist AWG chip 1211 through a cut line 63; and a third AWG chip 1213 made to adhere to the second AWG chip 1212 through another cut line 102. A plurality of kinds of prepared first AWG chips omitted in Figure are selectively connected to the second AWG chip 1212, and a plurality of kinds of prepared third AWG chips omitted in Figure are selectively connected to the second AWG chip 1212. The spectrum shapes in the input side and the output side are selected to be able to give desired characteristics to the array waveguide diffraction grating element.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:实现一种能够容易地实现波长补偿的阵列波导衍射光栅元件的制造方法,并实现阵列波导衍射光栅元件。解决方案:阵列波导衍射光栅元件61C包括三个芯片;第一AWG芯片121 1 ;第二AWG芯片121 2 通过切割线63粘附到第一AWG芯片121 1 。以及通过另一条切割线102粘附到第二AWG芯片121 2 的第三AWG芯片121 3 。图中省略了多种准备好的第一AWG芯片。选择性地将第二AWG芯片121 2 连接到第二AWG芯片121 2 ,并且将在图中省略的多种准备好的第三AWG芯片选择性地连接到第二AWG芯片121 2 。选择输入侧和输出侧的光谱形状,以便能够为阵列波导衍射光栅元件提供所需的特性。版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP2004206152A

    专利类型

  • 公开/公告日2004-07-22

    原文格式PDF

  • 申请/专利权人 NEC CORP;

    申请/专利号JP20040116478

  • 发明设计人 YONEDA SHIGERU;

    申请日2004-04-12

  • 分类号G02B6/13;G02B6/12;

  • 国家 JP

  • 入库时间 2022-08-21 23:32:58

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