首页> 外国专利> CERAMIC SUBSTRATE, SURFACE TREATMENT METHOD FOR CERAMIC SUBSTRATE, AND METHOD FOR FORMING THIN FILM ON ROUGHENED SURFACE OF CERAMIC SUBSTRATE

CERAMIC SUBSTRATE, SURFACE TREATMENT METHOD FOR CERAMIC SUBSTRATE, AND METHOD FOR FORMING THIN FILM ON ROUGHENED SURFACE OF CERAMIC SUBSTRATE

机译:陶瓷基质,用于陶瓷基质的表面处理方法以及在粗糙的陶瓷基质表面上形成薄膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a ceramic substrate in which a thin film excellent in adhesion is formed to a face even when a ceramic part and a metal part mixedly exist in the same face.;SOLUTION: The ceramic substrate comprises an insulating base material 2 made of an AIN and a conductor layer 3 made of metals. The surface roughness Ra1 of the insulating base material 2 is made 0.01-5μm. The surface roughness Ra2 of the conductor layer 3 is made 0.002-2μm. The surface roughness Ra1 of the insulating base material 2 is larger than the surface roughness Ra2 of the conductor layer 3.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种陶瓷基板,即使在同一面上混合存在陶瓷部件和金属部件,该陶瓷基板也能在表面形成附着力优异的薄膜。导电层3由AlN制成,导电层3由金属制成。绝缘基材2的表面粗糙度Ra1为0.01〜5μm。导体层3的表面粗糙度Ra2为0.002-2μm。绝缘基材2的表面粗糙度Ra1大于导体层3的表面粗糙度Ra2。版权所有:(C)2004,JPO

著录项

  • 公开/公告号JP2004172644A

    专利类型

  • 公开/公告日2004-06-17

    原文格式PDF

  • 申请/专利权人 IBIDEN CO LTD;

    申请/专利号JP20040064202

  • 发明设计人 SAEGUSA YOSHITAKA;ITO YASUTAKA;

    申请日2004-03-08

  • 分类号H05K3/38;

  • 国家 JP

  • 入库时间 2022-08-21 23:32:53

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