METHOD OF MEASURING TELECENTRIC ILLUMINATING PROPERTY OF CHARGED PARTICLE BEAM EXPOSURE DEVICE AND CHARGED PARTICLE BEAM EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method by which the telecentricity of a charged particle beam which illuminates a reticle can be evaluated.;SOLUTION: A formed aperture with pattern 12 is positioned in the optical path of an electron beam. Meantime, a wafer coated with a resist is placed on a reticle stage. Then the resist is exposed to light by forming the image of the formed aperture with pattern 12 on the wafer by means of the electron beam. This operation is performed a plurality of times by changing the height (position in the direction of optical axis) of the wafer on the reticle stage. The relative positional relation between patterns 14 thus found should not change even when the electron beam is received by changing the height of the wafer when an optical illumination system which illuminates a reticle 7 is perfectly telecentric. In case the relative position between the images of the patterns 14 changes when the height of the wafer is changed, the optical illumination system is not perfectly telecentric and the degree of telecentricity can be found from the change in the height of the wafer and the variation of the relative position between the images of the patterns 14.;COPYRIGHT: (C)2004,JPO&NCIPI