首页> 外国专利> POLYCRYSTALLINE THIN FILM, METHOD OF PRODUCING SAME, AND THIN FILM TRANSISTOR FREE OF DIRECTIONAL DEPENDENCE WITH RESPECT TO ACTIVE CHANNEL PRODUCED BY USING SAME

POLYCRYSTALLINE THIN FILM, METHOD OF PRODUCING SAME, AND THIN FILM TRANSISTOR FREE OF DIRECTIONAL DEPENDENCE WITH RESPECT TO ACTIVE CHANNEL PRODUCED BY USING SAME

机译:多晶硅薄膜,其制造方法以及与使用该薄膜制造的有源通道无关的薄膜晶体管

摘要

PROBLEM TO BE SOLVED: To provide a method of controlling a conformation of polycrystalline silicon formed when a polycrystalline silicon thin film is produced by the SLS crystallization method and a polycrystalline silicone thin film made by the method, and also to provide a TFT having an excellent characteristics free from the dependence of the TFT characteristics on the direction of an active channel, by making use of the polycrystalline silicon thin film produced by the above method.;SOLUTION: A polycrystalline silicon thin film for a display device is featured in that adjoining primary crystal grain boundaries are not parallel and an area enclosed by primary crystal grain boundaries is larger than 1 μm2, and also characterized by a step of crystallizing amorphous silicon using a laser beam, through the use of a mask having a mixed structure of a laser-transparent line-shaped pattern and a laser-opaque pattern.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种控制通过SLS结晶法制造多晶硅薄膜时形成的多晶硅的构型的方法,以及提供一种通过该方法制造的多晶硅的薄膜的方法。通过使用通过上述方法生产的多晶硅薄膜,TFT特性不受有源沟道方向的依赖。解决方案:用于显示设备的多晶硅薄膜的特征在于,相邻的初级晶粒边界不是平行的并且由初级晶粒边界包围的面积大于1μm 2 ,并且其特征还在于通过使用激光束使非晶硅结晶的步骤。一种具有激光透明线形图案和激光不透明图案的混合结构的掩模。版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP2004274037A

    专利类型

  • 公开/公告日2004-09-30

    原文格式PDF

  • 申请/专利权人 SAMSUNG SDI CO LTD;

    申请/专利号JP20040033412

  • 发明设计人 PARK JI YONG;PARK HYE HYANG;

    申请日2004-02-10

  • 分类号H01L21/20;H01L21/268;H01L21/336;H01L29/786;

  • 国家 JP

  • 入库时间 2022-08-21 23:32:19

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