PROBLEM TO BE SOLVED: To prevent a carbon film from depositing on a reflection mask, a lighting optical system for irradiating a soft X ray to the reflection mask, or a reduction projection optical system for forming the image of the pattern of the reflection mask in a soft X-ray reduction projection aligner using the soft X ray as the light source. SOLUTION: The partial pressure of a carbon compound gas in a first chamber 110 where a discharge X-ray source 111 and a lighting optical system 112 are provided s controlled to 1.33×10-8 Pa or less by a first diffusion pump 113. The partial pressure of the carbon compound gas of a region where a reflection mask 121 is arranged in a second chamber 120 where the reflection mask 121, a reflection optical system 123, and a reduction projection optical system 124 are provided; and a region where the reduction projection optical system 124 is arranged is controlled to 1.33×10-8 Pa or less by a second diffusion pump 125.
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