Sputtering target and its production manner null for indium stannic acid chemical material film formation

摘要

PURPOSE: To produce a high density sintered compact for indium-tin oxide film having a uniform density distribution. CONSTITUTION: Indium oxide-tin oxide powder is compacted, =80% density is attained by presintering and the resultant presintered compact is subjected to HIP accompanied by grain growth to obtain the objective indium oxide-tin oxide sintered compact having a uniform density distribution.