SYNTHETIC QUARTZ GLASS FOR VACUUM ULTRAVIOLET LIGHT, METHOD OF MANUFACTURING THE SAME AND MASK SUBSTRATES FOR VACUUM ULTRAVIOLET LIGHT USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a low cost synthetic quartz glass for vacuum ultraviolet light which has excellent properties and is manufactured using an existing general equipment without carrying out excessive and needless modification of a quartz glass synthesized by the soot method (VAD method) using a glass forming raw material such as SiCl₄ and a manufacturing method of the same and a mask substrate for vacuum ultraviolet light using the same.;SOLUTION: The synthetic quartz glass for vacuum ultraviolet light contains 5-20 ppm OH group and ≤50 ppm halogen element and has ≤0.1 cm^-1 absorption coefficient to the vacuum ultraviolet light having 163 nm wave length and ≤0.01 cm^-1 variation of the absorption coefficient in 163 nm wave length when the vacuum ultraviolet light is emitted. The manufacturing method of the same and the mask substrate for vacuum ultraviolet light using the same are provided.;COPYRIGHT: (C)2004,JPO