首页> 外国专利> Thin film type emitter and thin film type emitter matrix and those production manners and thin film type emitter matrix display device

Thin film type emitter and thin film type emitter matrix and those production manners and thin film type emitter matrix display device

机译:薄膜型发射器和薄膜型发射器矩阵及其制造方式和薄膜型发射器矩阵显示装置

摘要

PROBLEM TO BE SOLVED: To provide a thin film electron source having good electron emission efficiency by covering an upper electrode bus line layer with an upper electrode layer to form a laminated film for the portion other than an electron emission section. SOLUTION: A stripe-like lower electrode 11 made of an Al film having the thickness of about 300nm is formed on an insulating substrate 10 (made of glass or the like), and the portion other than its electron emission section 11a is anodized to form a protective insulating film 14 having the thickness of about 68nm. An upper electrode bus line layer is constituted of a lower layer 15-1 (thickness of about 30nm) made of Mo or the like and an upper layer 15-2 (thickness of about 100nm) made of Au or the like. An window is opened at the upper section of the electron emission section 11a to form a tunnel insulating layer 12a having the thickness of about 5.5nm, then an upper electrode layer 13 having an electrode section 13a constituted of a lower layer 13-1 (thickness of about 1nm) made of Ir, an intermediate layer 13-2 (thickness of about 2nm) made of Pt, and an upper layer 13-3 (thickness of about 3nm) made of Au is formed on the whole face of the substrate 10, and a thin film electron source is manufactured.
机译:解决的问题:通过用上电极层覆盖上电极总线层以形成除电子发射部分以外的部分的层叠膜,从而提供具有良好电子发射效率的薄膜电子源。解决方案:在绝缘基板10(由玻璃等制成)上形成由厚度约为300nm的Al膜制成的条状下部电极11,除其电子发射部分11a之外的其他部分进行阳极氧化以形成保护绝缘膜14的厚度约为68nm。上电极总线层由由Mo等制成的下层15-1(厚度约30nm)和由Au等制成的上层15-2(厚度约100nm)构成。在电子发射部分11a的上部打开一个窗口,以形成厚度约为5.5nm的隧道绝缘层12a,然后上电极层13具有由下层13-1构成的电极部分13a(厚度在基板10的整个面上形成由Ir构成的约1nm的膜,由Pt构成的中间层13-2(约2nm的膜厚),和由Au构成的上层13-3(约3nm的膜厚)。 ,并且制造薄膜电子源。

著录项

  • 公开/公告号JP3475023B2

    专利类型

  • 公开/公告日2003-12-08

    原文格式PDF

  • 申请/专利权人 株式会社日立製作所;

    申请/专利号JP19960250279

  • 发明设计人 楠 敏明;鈴木 睦三;

    申请日1996-09-20

  • 分类号H01J1/312;H01J9/02;H01J29/04;H01J31/12;

  • 国家 JP

  • 入库时间 2022-08-21 23:29:39

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