首页> 外国专利> HIGHLY EFFICIENT SEMICONDUCTOR LASER MANUFACTURING SYSTEM AND METHOD USING PRECURSOR HAVING DIRECT BONDING BETWEEN GROUP III ATOM AND NITROGEN ATOM

HIGHLY EFFICIENT SEMICONDUCTOR LASER MANUFACTURING SYSTEM AND METHOD USING PRECURSOR HAVING DIRECT BONDING BETWEEN GROUP III ATOM AND NITROGEN ATOM

机译:高效的半导体激光制造系统和方法,使用前体具有III族原子和氮原子之间的直接键合

摘要

PROBLEM TO BE SOLVED: To provide an efficient semiconductor laser manufacturing system and method that emits light in a range of 1.2 to 1.6μm.;SOLUTION: This is to disclose a system for manufacturing light emitting devices 102 and 152. Such a system includes a growth chamber 132 and at least one nitrogen precursor 138 introduced into the growth chamber. The nitrogen precursor 138 has a direct bonding of at least one group III atom and at least one nitrogen atom. Further, the nitrogen precursor 138 is used to form layers 111, 113, and 115 that compose part of active regions 114 and 164 of the light emitting device 102. The layers include indium, gallium, arsenic and nitrogen, and light with a wavelength range of about 1.2 to 1.6μm is emitted by the active regions 114 and 164. A manufacturing method for semiconductor structures 102 and 152 is also disclosed.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种有效的半导体激光器制造系统和方法,该系统和方法发射在1.2至1.6μm范围内的光。解决方案:这是公开一种用于制造发光器件102和152的系统。包括一个生长室132和至少一个引入该生长室的氮前驱体138。氮前体138具有至少一个III族原子和至少一个氮原子的直接键合。此外,氮前驱物138用于形成构成发光器件102的有源区114和164的一部分的层111、113和115。这些层包括铟,镓,砷和氮以及波长范围的光。有源区114和164发出约1.2至1.6μm的光。还公开了半导体结构102和152的制造方法。;版权:(C)2004,JPO

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