PROBLEM TO BE SOLVED: To provide a laser plasma EUV (extreme-ultraviolet) radiation source preventing succeeding target droplets from being affected by ionizing preceeding target droplets.;SOLUTION: A source nozzle (50) of an EUV radiation source has an orifice (56) with a predetermined dimension capable of ejecting droplets (54) at a rate set by a natural Rayleigh unstable destructive frequency of such a targeted material as generated by a piezoelectric transducer (58). A droplet generation rate is decided by factors in relation to a pulse frequency from an exciting laser (14) in order that buffer droplets (70) are applied between target droplets (66, 72). The buffer droplets (70) act for absorbing radiation radiated from the ionized target droplet (66) so as not to affect the succeeding target droplet (72).;COPYRIGHT: (C)2004,JPO
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