首页> 外国专利> MANUFACTURING METHOD FOR TRANSLUCENT ELECTROMAGNETIC-WAVE SHIELDING BASE MATERIAL, TRANSLUCENT ELECTROMAGNETIC-WAVE SHIELDING BASE MATERIAL, ELECTROMAGNETIC-WAVE SHIELDING COMPONENT, AND DISPLAY

MANUFACTURING METHOD FOR TRANSLUCENT ELECTROMAGNETIC-WAVE SHIELDING BASE MATERIAL, TRANSLUCENT ELECTROMAGNETIC-WAVE SHIELDING BASE MATERIAL, ELECTROMAGNETIC-WAVE SHIELDING COMPONENT, AND DISPLAY

机译:半透明电磁波屏蔽基体材料的制造方法,半透明电磁波屏蔽基体材料,电磁波屏蔽构件以及显示

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for a translucent electromagnetic-wave shielding base material which is excellent in electromagnetic-wave shielding properties, transparency and nonvisibility, which can be easily produced/supplied, and which can be inexpensively manufactured, the translucent electromagnetic-wave shielding base material, an electromagnetic-wave shielding component, and a display.;SOLUTION: This manufacturing method for the translucent electromagnetic-wave shielding base material comprises a process (A) wherein a plurality of conductive wires are continuously fed and arranged onto a resin layer, which is formed on a web-like translucent base material, along the flow direction of the translucent base material; and a process (B) wherein the conductive wires are cut in such a manner as to be as wide as the translucent base material, after being continuously fed and arranged onto the resin layer, which is formed on the web-like translucent base material, at an arbitrary angle from the lateral direction of the translucent base material.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种半透明电磁波屏蔽基材的制造方法,该半透明电磁波屏蔽基材具有优异的电磁波屏蔽特性,透明性和不可见性,可以容易地制造/提供并且可以廉价地制造。解决方案:该半透明电磁波屏蔽基材的制造方法包括工序(A),其中多根导线连续送入并布置沿着半透明基材的流动方向,在形成于网状半透明基材上的树脂层上;工序(B),在将导电线连续地供给并配置在形成于网状状的透明基材上的树脂层上之后,以与透明的基材一样宽的方式切断导线,与半透明基材的横向成任意角度。;版权所有:(C)2004,JPO

著录项

  • 公开/公告号JP2004106332A

    专利类型

  • 公开/公告日2004-04-08

    原文格式PDF

  • 申请/专利权人 HITACHI CHEM CO LTD;

    申请/专利号JP20020271500

  • 发明设计人 UEHARA TOSHISHIGE;YOKOZAWA SHUNYA;

    申请日2002-09-18

  • 分类号B32B3/24;B32B31/10;H05K9/00;

  • 国家 JP

  • 入库时间 2022-08-21 23:28:40

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