首页> 外国专利> Production manner of the vibrating film of semiconductor electret electrostatic microphone, the semiconductor electret electrostatic microphone null which uses the vibrating film and this vibrating

Production manner of the vibrating film of semiconductor electret electrostatic microphone, the semiconductor electret electrostatic microphone null which uses the vibrating film and this vibrating

机译:半导体驻极体静电传声器的振动膜的制造方式,使用该振动膜的半导体驻极体静电传声器以及该振动

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a diaphragm of a semiconductive electret-condenser microphone having excellent productivity.;SOLUTION: The manufacturing method comprises a process forming a mask 200 exposing a part equal to a diaphragm 500 to be formed on a surface 110 of a mother board 100 capable of etching, a process plating with a non- spreading metal film 300 becoming the diaphragm 500 on a part 111 equal to the diaphragm 500, a process clearing the board 100 of a plated part of the film 300 by etching from non plated rear side, and a process fitting a ring 400 to a cleared part 121 by etching from a rear side 120 of the board 100 so as to connect the ring 400 to the film 300 and also separating the film 300 as the diaphragm 500 from the board 100.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种具有优异生产率的半导体驻极体-电容传声器的振动膜的制造方法。解决方案:该制造方法包括形成掩模200的工艺,该掩模200暴露与待形成的振动膜500相等的部分。能够蚀刻的母板100的表面110,在与膜片500相同的部分111上用非铺展的金属膜300成为膜片500的过程电镀,清除板300的膜300的镀膜部分的过程通过从非镀覆后侧进行蚀刻,以及通过从板100的后侧120进行蚀刻来将环400装配到空隙部分121的过程,以将环400连接到膜300,并且还分离膜300作为膜。板100的膜片500 .;版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP3583350B2

    专利类型

  • 公开/公告日2004-11-04

    原文格式PDF

  • 申请/专利权人 ホシデン株式会社;

    申请/专利号JP20000184355

  • 发明设计人 杉森 康雄;大林 義昭;安田 護;

    申请日2000-06-20

  • 分类号H04R19/01;H04R31/00;

  • 国家 JP

  • 入库时间 2022-08-21 23:27:29

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