首页> 外国专利> SAMPLE FOR MEASURING TWO-DIMENSIONAL CARRIER DISTRIBUTION, METHOD OF MANUFACTURING THE SAME AND METHOD FOR EVALUATING TWO-DIMENSIONAL CARRIER DISTRIBUTION

SAMPLE FOR MEASURING TWO-DIMENSIONAL CARRIER DISTRIBUTION, METHOD OF MANUFACTURING THE SAME AND METHOD FOR EVALUATING TWO-DIMENSIONAL CARRIER DISTRIBUTION

机译:测量二维载波分布的样本,制造该样本的方法和评估二维载波分布的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a sample suitable for evaluating two-dimensional carrier distribution by a scanning probe microscope, wherein the sample is used for measuring the two-dimensional carrier distribution.;SOLUTION: The method of manufacturing the sample for measuring two-dimensional carrier distribution comprises a first process of depositing a thin film of thickness 1 μm or layer on a substrate where a measurement object region is formed, a second process of bonding a dummy wafer on the thin film, a third process of cutting the substrate at a right angle relative to its surface so as to make the cross section of the measurement object region exposed, and a fourth process of mirror-polishing the cut surface of the wafer.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种制造适于通过扫描探针显微镜评估二维载流子分布的样品的方法,其中该样品用于测量二维载流子分布。用于测量二维载流子分布的步骤包括:第一步骤,在形成测量对象区域的基板上沉积厚度为1μm或一层的薄膜;第二步骤,在该薄膜上键合虚设晶圆;第三步骤相对于其表面以直角切割基板以使测量对象区域的横截面暴露的过程,以及镜面抛光晶片切割表面的第四步;版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004134479A

    专利类型

  • 公开/公告日2004-04-30

    原文格式PDF

  • 申请/专利权人 FUJITSU LTD;

    申请/专利号JP20020295677

  • 发明设计人 KIKUCHI YOSHIO;

    申请日2002-10-09

  • 分类号H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 23:27:11

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